Research

Research & Publications

Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells

2022

1. Eindhoven University of Technology: B. Macco, M.L. van de Poll, T.M.P. Broekema, S.B. Basuvalingama, C.A.A. van Helvoirt, W.J.H. Berghuis, R.J. Theeuwes, N. Phunga, W.M.M. Kessels.
2. SALD B.V: B.W.H. van de Loo

Atomic-layer-deposited Al-doped zinc oxide as a passivating conductive contacting layer for n+-doped surfaces in silicon solar cells

2021

1. Eindhoven University of Technology: Bart Macco, Marc Dielen, Dennis G.J.A. Loeffen, Bart B. van Pelt, Nga Phung, , Marcel A. Verheijen, Wilhelmus M.M. Kessels
2. SALD B.V: Bas.W.H. van de Loo
3.TNO Energy Transition: Jimmy Melskens

Upgrade of an industrial Al-BSF solar cell line into perc using 3600 wafers/hour ALD Al2O3+SiNX solution ramp-up

2017

1. SoLayTec: F. Souren, B. Dielissen, X. Gay, R. Görtzen
2. Tempress Systems: P. Venema, M. Renes
3. Amtech Systems: J. Luchies

Is the Spatial ALD R&D configuration standard?

No. There are a lot of options which can be chosen. These depend on the research which will be done on the system. Many options can be upgraded at a later time, if the research is changed or intensified. Think of more bubblers to evaporate more materials for tertiary processes. Extra co-reactants like O₃ or O₂ plasma or the glovebox for an inert environment.

Is there only manual substrate handling?

No. both R&D systems can be equipped with an automation which can load substrates from a cassette to the substrate table, perform the deposition and take it back to the cassette.

Hindrik de Vries

System architect

hindrik.devries@spatialald.com

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