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R&D System

12+ years of experience

R&D Systems

The unique SALD R&D tool applies a nano coating with outstanding reproducibility, high uniformity and conformality at atmospheric pressure. Besides, the ambient R&D tool, SALD offers the R&D glovebox tool with a protected atmosphere which is ideal for battery and perovskite solar cell development necessitating an inert atmosphere.

SALD’s unique R&D systems offer unparalleled versatility in making nano coatings. These nano coatings can be applied to a variety of materials (flat, porous and 2.5D substrates). Many coating functionalities can be realized with commonly used metal oxides. But, there are countless other materials and, more materials are emerging.

Thanks to our extensive experience dating back to 2012, we have developed a unique and highly reliable tool with patented deposition head technology that guarantees a stable deposition process ensuring direct scalabability to S2S and R2R production platforms. The tool is easy to operate and does not have to be installed in a cleanroom.

Everything to contribute to a beautiful green future.

Unique deposition head technology

Versatile Research and Development tool

The R&D tool of SALD offers a very large parameter space due to the unique deposition head technology, containing a patented design, a variable number of process slots and the possibility of an integrated plasma source.

The tool can be operated within a temperature range of 25ºC – 350ºC whereas the exposure time can be varied from 2 milliseconds up to 10 seconds simply to explore the best performing thin films.

The substrate table can handle any type of 2.5 D, porous and non-porous material, ranging from glass, silicon wafers, metal sheets and foils achieving a thickness uniformity variation of less than 1%.
The system footprint is small and modular and can be tailored to the customer’s needs

R&D Tool with protected environment

The R&D tool with protective environment is the same as the atmospheric R&D tool, except that the fume cupboard housing is exchanged by a glovebox.
The glovebox can be optionally filled with argon or nitrogen and the oxygen and water vapour concentration can be controlled to less than 1 ppm. A glovebox is essential for a.o. battery and perovskite solar cells development.

Curious about the R&D systems SALD and the possibilities/options? Send us a message for more information about what SALD can add to your research.

  • A Spatial-ALD platform with ultimate flexibility
  • A flexible number of gas nozzle units
  • Multiple precursor evaporators can be installed
  • Co-dosing or super-cycles for multi-material deposition
  • Various co-reactants can be supplied
  • The Sample table can hold almost any type of substrate

Why our R&D System?

What makes our R&D System the best choice

Improved functionality

The system is compatible with a large variety of substrates. Different precursors can be used at the same time. Many options are available, also as upgrades when the system is installed at your site.

Maximum throughput

The deposition process on our R&D tools can be evaluated on high speeds, guaranteeing a maximum throughput in high-volume production.

Sustainable

The deposition process on our R&D tools can be optimized on material consumption and energy consumption, to ensure the lowest use of materials and energy at production capacity.

Lowest possible cost

An optimized process for material and energy consumption, a high throughput and a large area deposition ensure the lowest cost of a thin film layer per m2.

Material reduction

Especially for expensive materials, like Platina, Iridium, Ruthenium, a reduction of material usage (loading) is very important to maintain cost effective solutions.

Contact

Please feel free to contact us

Curious about the R&D systems SALD  and the possibilities/options? Send us a message for more information about what SALD can add to your research.

FAQ

R&D System

No. There are a lot of options to be chosen from. Depending on the specific research topic/needs the R&D system can be exactly tailored. Because R&D goals can change, we can offer multiple upgrades. For example, an additional bubbler system to process ternary or quaternary materials. Extra co-reactants like O3 or O2 plasma or processing in an inert environment using a glovebox. Or, if you want to automate specific process sequences (almost) anything is possible!

No. both R&D systems can be equipped with automated loading of the  substrates from a cassette to the substrate table, perform the deposition and take it back to the cassette.

No, a cleanroom environment is not necessary. Due to the design of the deposition head the process is effectively protected from the outside to get the best deposition. To prevent particle contamination of the sample during loading and unloading the tool can be equipped with a glovebox and HEPA (filter fan) unit to create a clean micro environment.

Pieter van der Marel

Tech Sales and Business Development

pieter.vandermarel@spatialald.com

+31 6 28 33 08 88

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