Spatial Atomic Layer Deposition, the future of technology for today's major growth markets

SALD, the innovator in Spatial ALD technology

Atomic layer deposition (ALD) is a technology that produces very thin, conformal films with control of thickness and composition at atomic level. ALD is best known for the production of computer chips. The disadvantage is that it works slowly; each layer takes relatively much time. In 2008 TNO scientists developed a brilliant solution for this: Spatial ALD. With this new technology TNO was able to increase the production speed 5 to 10 times, while the coating quality remained the same.

This led to the establishment of SoLayTec, which developed and sold advanced Spatial ALD machines for the mass production of solar panels. This makes SoLayTec the only company with large-scale production experience within the emerging world of Spatial ALD. The in-depth expertise in Spatial ALD technology, combined with the unique ability to transfer it from lab to fab, offers great opportunities in today's growth markets. That is why a new company has been set up alongside SoLayTec, with the ambition to be at the forefront of promising new applications of Spatial ALD. The name chosen is the worldwide abbreviation for this innovative technology: SALD.

Major growth markets

Batteries for electric cars 

Next Gen Solar

Vacuum products

New textiles

Unique protected technology

In all these growth markets, maximum throughput at the lowest possible costs is essential for success. SALD has developed a unique technology that makes this possible, which is protected by several patents. This technology has been incorporated into a compact machine that can be used for research as well as for small-scale production. It does not matter which material is involved: battery, solar panel, OLED or foil. Moreover, SALD is the only company in the world that has the expertise to subsequently quickly and reliably upscale the Spatial ALD technology to high volume production.