Spatial Atomic Layer Deposition (Spatial ALD) delivers a form-following high-quality coating at the atomic level. Compared with conventional ALD, this ingenious technology stacks atomic layers many times faster.
Highest throughput and coating performance at the lowest costs are the key added values Spatial ALD brings. Our in-depth expertise in Spatial ALD technology, combined with our unique ability to swiftly transfer your application from lab to fab, offers you exciting and groundbreaking opportunities in today’s growth markets.