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Advancing Solar Technology with Spatial Atomic Layer Deposition

SALD Technology

Advancing Solar Technology with Spatial Atomic Layer Deposition

The photovoltaic market and we have a long history. Spatial Atomic Layer Deposition (Spatial ALD) has been widely applied for the application of an ultra- thin surface passivation layer on silicon PERC solar cells. Our experience and technology makes it possible to produce high-quality, high-efficiency solar panels with atomic level precision that requires less raw materials. In other words; do more with less!

Thin film technologies

Spatial ALD also offers many opportunities in upcoming solar cell markets such as organic, perovskite, and tandem photovoltaics. These thin film markets are the future of PV due their high efficiency and potentially low manufacturing costs. Moreover, these solar cells give the opportunity for flexible applications such as BIPV and to increase the efficiency of Si solar cells in tandem configuration. An additional advantage of tandem solar cells is the reduced (floor)space required for the same power output. Although initially counter-intuitive, tandem solar cells require less scarce materials, such as silver. This is due to the fact that these cells operate at higher voltages and therefore lower current!

Spatial ALD metal oxide layers can ensure higher stability and longer lifetime; a requirement for the breakthrough of these technologies. In parallel, Spatial ALD can be used to apply a water and oxygen barrier as an encapsulation layer, for example as a replacement for the present pricey barrier foils. This allows, among others, OPV solar cells to be protected from moisture at lower production costs.

Customised solutions with Spatial ALD

The flexibility of Spatial ALD enables customisation, allowing manufacturers to develop solar cells with different structures and properties depending on the specific application. Please challenge our innovators; together we will develop your Spatial ALD application to the next level.

  • Enabling high-efficiency (tandem) solar cells
  • Improved cell stability
  • Thin encapsulation and protective layers
  • Roll-to-roll & sheet-to-sheet continuous production
  • Atmospheric pressure

Spatial ALD provides ultra-high precision and uniformity in the application of thin metal-oxide functional layers, resulting in higher efficiency and durability.

By applying non-hazardous ultra-thin, protective layers that extend the lifetime and improve the stability of solar cells, Spatial ALD contributes to renewable and sustainable energy production.

Using Spatial ALD all kinds of materials can be deposited; especially useful are metal oxides such as SnO2, TiO2, NiO, ZnO:Al, and Al2O3 which have been developed in-house. We are always open to explore new materials, don’t hesitate to reach out!

Among other benefits are lightweight structures, lower raw material consumption and energy usage during production, and higher efficiency compared to traditional panels.

Floor Souren

Sr. Process Engineer


The differences

Temporal ALD vs Spatial ALD

Temporal ALD

  • High-quality 3D layers and suitable for porous substrates.
  • Limited deposition speed
  • Limited in maximum substrates

Spatial ALD

  • High-quality 3D layers and suitable for porous substrates.
  • 100 times faster deposition speed than conventional ALD by our spatial technology in combination with proprietary plasma enhanced deposition
  • Scalable to large areas & flexible substrates
  • Industrially proven, cost-efficient mass production.


Why choose for the R&D Tool?

Improved functionality

Maximum throughput


Lowest possible costs

Improved material reduction

Innovation by working together

Get in touch!

Discover the opportunities that Spatial ALD offers for your sector or project. Are you ready to explore the future of battery technology? Get in touch.

Are you ready to explore new opportunities together? We are!

Get in touch